Aeroflex Microelectronic Solutions

From GaAs to silicon. No one provides a more comprehensive approach to handling all your requests for standard and custom Schottkys, PINs, NIPs, varactors, detectors, limiters, capacitors, resistors, inductors, attenuator pads, and so much more. And they come delivered every way imaginable, from wafers to plastic surface mount.

Aeroflex Metelics Products

Quality & Reliability

Aeroflex / Metelics is committed to quality through interactions between engineering, manufacturing and quality assurance groups at design, development, manufacture, test, and environmental screening levels for all Aeroflex / Metelics products.

Aeroflex / Metelics is firmly committed to producing and providing the highest level of quality products free of defects and deviations. Our primary goal is to achieve consistently high standards and Customer satisfaction based on internal and Customer expectations and requirements by:

  • Documenting procedures and specifications used in the manufacturing, testing and environmental screening of all Aeroflex / Metelics products.
  • Calibrating equipment with standards traceable to National Institute of Standards and Technology (NIST)
  • Adhering to Aeroflex / Metelics internal Electrostatic Discharge (ESD) program requirements based on ANSI/ESD S20.20. All Aeroflex / Metelics Semiconductor and Thin Film products are treated to the most sensitive product ESDS threshold level Class 1 per MIL-STD-19500.
  • Assuring all incoming materials conform to documented specifications.
  • Verifying process controls at fabrication, manufacturing and test levels.
  • Performing environmental screening and conformance inspection up to and including space level per MIL-PRF-19500 and/or Customer specific requirements.

Aeroflex / Metelics Sunnyvale, CA facility is ISO 9001 registered achieving certification to ISO 9001:2008 in March of 2009 and Aeroflex / Metelics Londonderry, NH and Lawerance, MA facilies, are ISO 9001 registered achieving certification to ISO 9001:2008 in July of 2009.